New Patent Granted – March 6th 2018
US 9,911,594: Selective atomic layer deposition process utilizing patterned SAM for 3D structure application
About Ludovic Godet
This author has not yet filled in any details.So far Ludovic Godet has created 7 blog entries.
New Patent Granted – Oct 3rd 2017
US 9,777,378: Advanced Process flow for High Quality FCVD films
New Patent Granted – Sept 9th 2017
US 9,767,987: Method and System for Modifying Substrate Relief Feature using Ion Implantation,
New Patent Granted – Sept 5th 2017
US 9,754,791: Selective Deposition Utilizing Mask and Directional Plasma Treatment
New Patent Granted – Aug 29th 2017
US 9,748,148: Localized Stress Modulation for Overlay and EPE
New Patent Granted – Aug 15th 2017
US 9,733,579: Tooling Configuration for Electric/Magnetic Field Guided Acid Profile Control in PhotoResist Layer
New Patent Granted – July 25th 2017
"US 9,716,005: Plasma Poisoning to Enable Selective Deposition"
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