New Publication
"Ion Implant Enabled 2x Lithography" AIP Conf. Proc. 1321, 171
New Publication
" Formation of Ultra-Shallow Junctions by Advanced Plasma Doping Techniques", AIP Conf. Proc. 1321, 146
New Publication
"Optimization and Control of Plasma Doping Processes", AIP Conf. Proc. 1321, 142
New Patent Granted Feb 1st 2011
"Monitoring Plasma Ion Implantation Systems for Fault Detection and Process Control"
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